{"title":"A Study Of Polyimide Adhesion To Epoxy Resjn In PFP Using Multivariate Analysis Of XPS Spectra","authors":"K. Takeuchi, K. Tsutsui, N. Miura","doi":"10.1109/IEMT.1993.639283","DOIUrl":null,"url":null,"abstract":"The adhesion between polyimide and mold resin is one of the key characteristics of packaging reliability in semiconductor device manufacturing. Poor adhesion causes sometimes reliability problems on plastic flat packaging (PFP) products. The requirements of adhesion enhancement and its evaluation will increase, accompanied with thinner and higher density packaging products. Polyimide adhesion to mold resin has been studied from a view point of surface treatment of passivation material. Polyimide surface, modified through various conditions was characterized by X-ray photoelectron spectroscopy (XPS), contact angle and adhesion strength. XPS spectra was curve fitted and classified by multivariate analysis. The result shows that XPS cubon peak pattems are classified between good and poor samples by two factors, which are the moisture absorption and the oxygen content (C=O bonding) in polyimide. The moisture is proportional to the contact angle of glycerin droplet on the surface. Oxygen content increases with the surface roughness by 4 plasma treatment. It indicates that the adhesion between polyimide and epoxy resin is related to both chemical and mechanical interactions of two materials. These factors are shown on the score plot by multivariate analysis.","PeriodicalId":170695,"journal":{"name":"Proceedings of Japan International Electronic Manufacturing Technology Symposium","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Japan International Electronic Manufacturing Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.1993.639283","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The adhesion between polyimide and mold resin is one of the key characteristics of packaging reliability in semiconductor device manufacturing. Poor adhesion causes sometimes reliability problems on plastic flat packaging (PFP) products. The requirements of adhesion enhancement and its evaluation will increase, accompanied with thinner and higher density packaging products. Polyimide adhesion to mold resin has been studied from a view point of surface treatment of passivation material. Polyimide surface, modified through various conditions was characterized by X-ray photoelectron spectroscopy (XPS), contact angle and adhesion strength. XPS spectra was curve fitted and classified by multivariate analysis. The result shows that XPS cubon peak pattems are classified between good and poor samples by two factors, which are the moisture absorption and the oxygen content (C=O bonding) in polyimide. The moisture is proportional to the contact angle of glycerin droplet on the surface. Oxygen content increases with the surface roughness by 4 plasma treatment. It indicates that the adhesion between polyimide and epoxy resin is related to both chemical and mechanical interactions of two materials. These factors are shown on the score plot by multivariate analysis.