In Situ Monitoring Technique of Self-Heating in Bulk MOSFETs at Cryogenic Temperatures using Subthreshold Current

Masayuki Ichikawa, Takahisa Tanaka, K. Uchida, Tomohisa Miyao, Munehiro Tada, H. Ishikuro
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Abstract

This work proposes an evaluation technique of self-heating (SH) in a 65-nm bulk CMOS transistor at cryogenic temperature (4.2K). For the in-situ monitoring of self-heating in cryo-CMOS circuits, transient response of the subthreshold drain current is used, which makes it possible to estimate the temperature at on-state of MOSFETs. The relation between the temperature increase by self-heating and power consumption of MOSFET has been experimentally obtained, which will help a design of high performance cryo-CMOS circuits for quantum computer application.
基于亚阈值电流的体mosfet低温自热原位监测技术
本文提出了一种低温(4.2K)下65nm块体CMOS晶体管自加热(SH)的评估技术。利用亚阈值漏极电流的瞬态响应,可以对mosfet的导通状态温度进行原位监测。实验得到了MOSFET自加热升温与功耗之间的关系,这将有助于设计用于量子计算机的高性能冷冻cmos电路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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