Compact Modeling of Flicker Noise in High Voltage MOSFETs and Experimental Validation

R. Goel, Y. Chauhan
{"title":"Compact Modeling of Flicker Noise in High Voltage MOSFETs and Experimental Validation","authors":"R. Goel, Y. Chauhan","doi":"10.1109/LAEDC51812.2021.9437922","DOIUrl":null,"url":null,"abstract":"An analytical model of flicker noise (also called 1/f or low frequency noise) for the drift region is developed to formulate a 1/f model for high voltage MOSFETs using the sub-circuit approach in this work. For halo doped drain extended MOSFET (DEMOS), the contribution factors of halo, channel and drift regions are obtained to capture anomalous behavior of 1/f noise. Similar to Halo doped DEMOS, for LDMOS, the contribution factors for channel and the drift region are obtained to capture the SID for different drain biases and channel lengths. The proposed model is validated with measurement data of 50V LDMOS and DEMOS.","PeriodicalId":112590,"journal":{"name":"2021 IEEE Latin America Electron Devices Conference (LAEDC)","volume":"198 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE Latin America Electron Devices Conference (LAEDC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LAEDC51812.2021.9437922","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

An analytical model of flicker noise (also called 1/f or low frequency noise) for the drift region is developed to formulate a 1/f model for high voltage MOSFETs using the sub-circuit approach in this work. For halo doped drain extended MOSFET (DEMOS), the contribution factors of halo, channel and drift regions are obtained to capture anomalous behavior of 1/f noise. Similar to Halo doped DEMOS, for LDMOS, the contribution factors for channel and the drift region are obtained to capture the SID for different drain biases and channel lengths. The proposed model is validated with measurement data of 50V LDMOS and DEMOS.
高压mosfet闪烁噪声的紧凑建模及实验验证
本文建立了漂移区闪烁噪声(也称为1/f低频噪声)的解析模型,利用子电路方法建立了高压mosfet的1/f模型。对于晕掺杂漏极扩展MOSFET (DEMOS),获得了晕、沟道和漂移区的贡献因子,以捕获1/f噪声的异常行为。与Halo掺杂的demo类似,对于LDMOS,获得了通道和漂移区域的贡献因子,以捕获不同漏极偏置和通道长度的SID。用50V LDMOS和demo的测量数据验证了该模型的有效性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信