Retention characteristics of zero-capacitor RAM (Z-RAM) cell based on FinFET and tri-gate devices

Abstract

In this paper we experimentally study for the first time the retention characteristics of Z-RAM cells based on CMOS FinFET and tri-gate devices. A retention time of few milliseconds is measured at room temperature on 100 nm devices. This FinFET based Z-RAM memory will allow manufacturing of very low cost DRAMs and eDRAMs for 45 and sub 45-nm generations.