Hopping conduction in lithium diffused and annealed GaAs

J. Gudmundsson, H. Svavarsson, H. Gíslason
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Abstract

Temperature dependent conductivity and Hall effect measurements were carried out in the temperature range 30-300 K on Li-diffused and annealed GaAs. Li in-diffusion into GaAs reduces the free carrier concentration which leads to electrical conductivity as low as 10/sup -7/ S/cm. Annealing the lithium diffused samples at temperatures above 200/spl deg/C significantly increases the room temperature conductivity to 1-10 S/cm, depending on the annealing temperature. In samples annealed at 300-500/spl deg/C the temperature dependence of the conductivity indicates that hopping conduction sets in at temperatures below 100 K. We relate this to enhanced gallium vacancy (V/sub Ga/) and gallium antisite (Ga/sub As/) concentration in Li in-diffused and annealed samples.
锂扩散退火砷化镓中的跳变传导
在30-300 K的温度范围内,对li扩散和退火的GaAs进行了温度依赖性电导率和霍尔效应测量。Li在GaAs中的扩散降低了自由载流子浓度,导致电导率低至10/sup -7/ S/cm。在高于200/spl℃的温度下退火锂扩散样品,根据退火温度的不同,室温电导率显著提高到1-10 S/cm。在300-500/spl度/C退火的样品中,电导率的温度依赖性表明,在低于100 K的温度下,会出现跳变导电。我们将此与Li扩散和退火样品中镓空位(V/sub Ga/)和镓反位(Ga/sub As/)浓度的增强联系起来。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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