{"title":"Steady-state bipolar transistor simulator for the 77 K-300 K temperature range","authors":"M. Chrzanowska-Jeske, R. Jaeger","doi":"10.1109/CICC.1989.56720","DOIUrl":null,"url":null,"abstract":"BILOW, a steady-state one-dimensional bipolar transistor simulator for the 77 K-300 K temperature range, is presented. Examples of internal device characteristics for a medium-voltage n-p-n silicon bipolar transistor demonstrate the capability of the simulation. Calculated current gain and unity gain frequency versus current density for temperatures down to liquid nitrogen temperature (77 K) are presented and discussed. It is concluded that the simulator is a very useful tool for investigating different design approaches and the influence of process design on the temperature dependence of bipolar transistor parameters","PeriodicalId":165054,"journal":{"name":"1989 Proceedings of the IEEE Custom Integrated Circuits Conference","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1989 Proceedings of the IEEE Custom Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.1989.56720","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
BILOW, a steady-state one-dimensional bipolar transistor simulator for the 77 K-300 K temperature range, is presented. Examples of internal device characteristics for a medium-voltage n-p-n silicon bipolar transistor demonstrate the capability of the simulation. Calculated current gain and unity gain frequency versus current density for temperatures down to liquid nitrogen temperature (77 K) are presented and discussed. It is concluded that the simulator is a very useful tool for investigating different design approaches and the influence of process design on the temperature dependence of bipolar transistor parameters