M. N. Osman, Z. Awang, S. Yaakob, M. Yahya, A. Mat
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引用次数: 1
Abstract
A small signal analysis was performed on a specific 0.2 mum HEMT device to study the impact of multiple-gated layout towards the gain and cut-off frequency performance. The characterization process was using on-wafer measurement technique to AlGaAs/InGaAs HEMT devices which consisted of three types of layouts of various gate finger numbers and widths. The devices were biased at the optimum basing voltage obtained from DC characterization performed previously. From the result, it was observed that the device with higher number of gates exhibited higher gain only at low frequency, while at higher frequency the gain dropped significantly. This significant drop in gain was due to the increase of the gate-source capacitance in the device, thus leading to a reduction of the device cut-off frequency. The experimental findings were strongly supported by simulation which was based on related theory on the layout dimension contribution.
在特定的0.2 μ m HEMT器件上进行了小信号分析,研究了多门控布局对增益和截止频率性能的影响。表征过程采用片上测量技术对AlGaAs/InGaAs HEMT器件进行表征,该器件由三种不同栅极指数和宽度的布局组成。器件偏置在从先前进行的直流特性获得的最佳基电压上。从结果可以看出,栅极数较多的器件仅在低频时具有较高的增益,而在高频时增益明显下降。这种显著的增益下降是由于器件中栅极源电容的增加,从而导致器件截止频率的降低。基于布局尺寸贡献相关理论的仿真结果有力地支持了实验结果。