Diffusion in polymer-derived Si-(B-)C-N ceramics, particularly amorphous Si29B9C41N21

T. Voss, A. Strohm, W. Frank
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引用次数: 5

Abstract

Abstract The diffusion coefficients (D) of implanted radioisotopes – 71Ge, 31Si, and 11C – in the polymer-derived amorphous (a-)Si29B9C41N21 ceramic have been measured as functions of temperature (T) in different as-pyrolysed states (71Ge) or after pre-diffusion annealing at 1600°C for 2 h (71Ge, 31Si, and 11C) by means of radiotracer techniques, in which serial sectioning was done by ion-beam sputtering. In the cases of 31Si (half-life t1/2 = 2.6 h) and 11C (t1/2 = 20.4 min), implantation, diffusion annealing, and sputter-sectioning were done on beamline and in situ of a novel set-up specially constructed for diffusion studies of short-lived radiotracer atoms. In all cases, the T-dependencies of D are of Arrhenius type. Comparing the Arrhenius parameters of D(71Ge) to previous data on diffusion in (B-free) a-Si28C36N36, it is concluded that the diffusion of 71Ge in the a-Si29B9C41N21 ceramic is controlled by vacancies in its a-Si3N4-yCy phase which become increasingly smeared out when the C-content y dec...
聚合物衍生的Si-(B-)C-N陶瓷中的扩散,特别是非晶Si29B9C41N21
摘要采用离子束溅射连续切片的放射性示踪技术,测定了注入放射性同位素71Ge、31Si和11C -在聚合物衍生的非晶态(a-)Si29B9C41N21陶瓷中不同热解态(71Ge)或1600℃预扩散退火2 h (71Ge、31Si和11C)下的扩散系数(D)与温度(T)的关系。在31Si(半衰期t1/2 = 2.6 h)和11C (t1/2 = 20.4 min)的情况下,在专门用于短寿命放射性示踪原子扩散研究的新型装置上,在束线和原位上进行了注入、扩散退火和溅射切割。在所有情况下,D的t依赖都是阿伦尼乌斯型的。通过比较D(71Ge)在a-Si29B9C41N21陶瓷中扩散的Arrhenius参数,得出结论:71Ge在a-Si29B9C41N21陶瓷中的扩散受a-Si3N4-yCy相空位的控制,当c含量降低时,空位逐渐消失。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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