LFSR Test Pattern Crosstalk in Nanometer Technologies

Abstract

In this paper we investigate the crosstalk influence of interconnects on test patterns in integrated circuits in today and future technologies. The test patterns are produced by a linear feedback shift register (LFSR). We show the per unit length line parameters L’, C’ and R’ of interconnects in 150 nm down to 35 nm technologies wherefore we assume the smallest geometries predicted by the SIA roadmap. Using these parameters we demonstrate that crosstalk influences the signal behaviour depending on the technology used. The test patterns were generated by a 5 bit LFSR using an interconnect system with a length of 1 mm in these future technologies.