The Strong Effect of Spectral Mode and Directional Electrical Field for Nuisance Filtering In Defect Inspection

Abstract

As shrinkage of design nodes and increase of pattern density, defects become more and more critical in the integrated circuit (IC) manufacturing. Capturing more defects is essential in defects reduction which is the key point in yield enhance. Broadband plasma (BBP) optical defect inspection systems are widely used for defect monitoring. For defect inspection recipe, the signal to noise ratio (SNR) of defects is the key parameter. The more the SNR is high, the more the defects are easily captured. Base on this, noise filtering is benefit to the development of the defect capture ratio. As design nodes shrink and pattern density increases, noise filtering is becoming more and more difficult. In this paper, spectral mode and directional electrical field were used in noise filtering in research and development of 14nm fin loop technology process.