Toward sub-10-nm resolution zone plates using the overlay nanofabrication processes

SPIE MOEMS-MEMS Pub Date : 2008-02-07 DOI:10.1117/12.768878
W. Chao, E. Anderson, P. Fischer, Donghyun Kim
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引用次数: 11

Abstract

Soft x-ray zone plate microscopy has proven to be a valuable imaging technique for nanoscale studies. It complements nano-analytic techniques such as electron and scanning probe microscopies. One of its key features is high spatial resolution. We developed an overlay nanofabrication process which allows zone plates of sub-20 nm zone widths to be fabricated. Zone plates of 15 nm outer zones were successfully realized using this process, and sub-15 nm resolution was achieved with these zone plates. We extend the overlay process to fabricating zone plates of 12 nm outer zones, which is expected to achieve 10 nm resolution. In addition, we have identified a pathway to realizing sub-10 nm resolution, high efficiency zone plates with tilted zones using the overlay process.
采用覆盖纳米工艺制备亚10nm分辨率的带片
软x射线带板显微镜已被证明是一种有价值的纳米级研究成像技术。它补充了纳米分析技术,如电子和扫描探针显微镜。其主要特点之一是高空间分辨率。我们开发了一种覆盖纳米制造工艺,该工艺允许制造区域宽度低于20纳米的带板。利用该工艺成功实现了15 nm外带的带片,并实现了15 nm以下的分辨率。我们将覆盖工艺扩展到制造12nm外区带板,预计可达到10nm分辨率。此外,我们已经确定了一种途径,以实现亚10纳米分辨率,高效带板倾斜的区域使用覆盖工艺。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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