Y. Morita, H. Fujiwara, Hiroki Noguchi, Y. Iguchi, Koji Nii, H. Kawaguchi, M. Yoshimoto
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引用次数: 159
Abstract
This paper demonstrates that an 8T memory cell can be alternative design to a 6T cell in a future highly-integrated SRAM, in a 45-nm process and later with large threshold-voltage variation. The proposed voltage-control scheme that improves a write margin and read current, and the write-back scheme that stabilizes unselected cells are applied to the 8T SRAM. We verified that the low-voltage operation at 0.42 V in a 90-nm 64-Mb SRAM is possible under dynamic voltage scaling (DVS) environment.