Preparation and characterization of Cu2ZnGeS4 thin films by sulfurizing reactively sputtered precursors

Jian Chen, Lianbo Zhao, Fangyang Liu, Shujuan Huang, X. Hao
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引用次数: 1

Abstract

Cu2ZnGeS4 (CZGS) thin films were first grown by reactive magnetron co-sputtering technique and post sulfurization. Raman and X-ray diffraction (XRD) examination confirm the synthesized films to be tetragonal stannite CZGS together with ZnS secondary phase. The effect of two manufacturing conditions was investigated: sputtering pressure for precursor deposition and sulfurization temperature. By decreasing the sputtering pressure, the CZGS grain size in the sulfurized films is found to be increased. By increasing the sulfurization temperature, the CZGS grain size is also increased. However, serious voids and pinholes are found in the sample undergoing high sulfurization temperature. The formation of voids and pinholes can be explained by Ge loss via Ge sulfides sublimation. Besides, the M0S2 layer thickness is found dramatically increased after high-temperature sulfurization process.
反应溅射前驱体硫化法制备Cu2ZnGeS4薄膜及表征
采用反应磁控共溅射技术和后硫化法制备Cu2ZnGeS4 (CZGS)薄膜。拉曼和x射线衍射(XRD)测试证实了合成的薄膜为含ZnS二次相的四方锡型CZGS。研究了沉积前驱体的溅射压力和硫化温度两种制备条件的影响。通过降低溅射压力,可以使硫化膜中的CZGS晶粒尺寸增大。随着硫化温度的升高,CZGS的晶粒尺寸也有所增大。然而,在高硫化温度下,样品中发现了严重的空洞和针孔。孔洞和针孔的形成可以用硫化物升华造成的锗损失来解释。高温硫化后,M0S2层厚度显著增加。
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