A novel dual-SCR ESD protection structure in 0.35-μm SiGe BiCMOS process

Hou Fei, Liu Nie, Liu Ji-zhi, Liu Zhiwei
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Abstract

This paper presents a novel dual silicon controlled rectifier (SCR) with silicon-germanium heterojunction bipolar transistor (SiGe HBT) in a 0.35-μm SiGe BiCMOS process. This device includes two back-to-back HBTs with shared sub-collector. Two resistors are connected parallel with base electrode and emitter electrode in each HBT. In order to enhance the protective ability, a layout of multiple emitter fingers shared with one common base are proposed. The TLP test results prove the ability of ESD protection.
一种新型的0.35 μm SiGe BiCMOS双晶闸管ESD保护结构
提出了一种在0.35 μm SiGe BiCMOS工艺中采用硅锗异质结双极晶体管(SiGe HBT)的新型双硅控整流器(SCR)。该设备包括两个背靠背的hbt和共享的子收集器。在每个HBT中,两个电阻与基极和发射极并联连接。为了提高保护能力,提出了一种多发射极指共用一个基极的布置方案。TLP测试结果证明了其ESD防护能力。
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