Architecture approaching the atomic scale

A. DeHon
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引用次数: 16

Abstract

Both bottom-up and top-down techniques have been used to fabricate assemblies of devices and interconnect where key, density-defining feature sizes are on the order of ten atoms wide. We show how complete computing architectures can be constructed from these new techniques and building blocks despite high defect rates, extreme regularity requirements, and statistical assembly. We further highlight the paradigm shifts in integrated circuit design and architecture which appear necessary to accommodate these atomic-scale effects. Our estimates suggest a 10 nm full-pitch FPGA-like design can achieve one to two orders of magnitude greater logic density than ideal, defect-free lithographic scaling to 22 nm.
接近原子尺度的建筑
自底向上和自顶向下的技术都被用于制造设备组件和互连,其中关键的密度定义特征尺寸在十个原子宽的量级上。我们展示了如何从这些新技术和构建块构建完整的计算体系结构,尽管存在高缺缺率、极端规则要求和统计组装。我们进一步强调了集成电路设计和架构的范式转变,这似乎是适应这些原子尺度效应所必需的。我们的估计表明,10纳米全间距类fpga设计可以实现比理想的22纳米无缺陷光刻缩放高一到两个数量级的逻辑密度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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