Excitonic Behavior in Pseudomorphic InGaAs/(Al)GaAs Quantum Wells Grown by Mbe

D. Ackley, C. Colvard, H. Lee, N. Nouri
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Abstract

Pseudomorphic InGaAs quantum well (QW) structures have been the subject of considerable interest for electronic and optoelectronic devices. In order to optimize pseudomorphic QW structures for advanced devices it is necessary to understand the properties of the interfaces with the barrier layers. To this end we have utilized photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopy to investigate the optical properties of InGaAs strained single quantum wells (QWs) grown by molecular beam epitaxy with different barrier layers. Samples with 100A In.15Ga.85As layers bounded on top and bottom by either GaAs or Al.15Ga.85As were studied over the temperature range 2-300 K. All four possible barrier combinations were included. The GaAs/InGaAs/GaAs samples exhibited linewidths as small as 1.3 meV at 2 K, which are the narrowest yet observed for these structures grown by conventional techniques. Similar results were observed at 2 K for QWs with AlGaAs barriers below, but the linewidths of samples with AlGaAs on top were substantially broadened. Measurements of the excitation spectra of these samples showed a substantial free exciton component to the luminescence from samples without top AlGaAs barriers. Samples with top AlGaAs barriers, however, showed little free exciton contribution. Investigation of the temperature behavior of the luminescence suggest that the homogeneous broadening in all the samples is similar, but that the inhomogeneous contributions are different for the various structures. In addition, the temperature dependent measurements showed an additional bound exciton component of the samples with top barriers that was ionized at temperatures above 15 K. Samples with lower AlGaAs barriers showed an anomalous increase in linewidth with increasing temperature which is still under investigation.
Mbe生长InGaAs/(Al)GaAs赝晶量子阱的激子行为
假晶InGaAs量子阱(QW)结构一直是电子和光电子器件中相当感兴趣的主题。为了优化先进器件的伪晶量子阱结构,有必要了解与势垒层的界面的性质。为此,我们利用光致发光(PL)和光致发光激发(PLE)光谱研究了不同势垒层的分子束外延生长的InGaAs应变单量子阱(QWs)的光学性质。样品与100A In.15Ga。在顶部和底部有GaAs或al - 15ga的as层。85As在2-300 K的温度范围内进行了研究。所有四种可能的屏障组合都包括在内。在2k时,GaAs/InGaAs/GaAs样品的线宽小至1.3 meV,这是迄今为止通过传统技术生长的这些结构中观察到的最窄的线宽。在2 K时,下面有AlGaAs势垒的QWs也观察到类似的结果,但顶部有AlGaAs的样品的线宽大大拓宽。这些样品的激发光谱测量表明,没有顶部AlGaAs势垒的样品的发光存在大量的自由激子成分。然而,具有顶部AlGaAs势垒的样品显示出很少的自由激子贡献。发光温度行为的研究表明,所有样品的均匀展宽是相似的,但不同结构的非均匀贡献是不同的。此外,温度相关的测量结果显示,在温度高于15 K时电离的具有顶部势垒的样品中存在额外的束缚激子成分。具有较低AlGaAs势垒的样品显示线宽随温度升高而异常增加,这仍在研究中。
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