Modeling of high-current damage in SiGe HBTs under pulsed stress

U. Raghunathan, Brian R. Wier, Rafael Perez Martinez, Zachary E. Fleetwood, Anup P. Omprakash, Hanbin Ying, S. Zeinolabedinzadeh, J. Cressler
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引用次数: 2

Abstract

High-current pulsed stress measurements are performed on SiGe HBTs to characterize the damage behavior and create a comprehensive physics-based TCAD damage model for Auger-induced hot-carrier damage. The Auger hot-carrier generation is decoupled from classical mixed-mode damage and annealing on the output plane by using pulsed stress conditions to modulate the self-heating within the device under stress. The physics of high-current degradation is analyzed, and a temperature dependent degradation model is presented. This model is the first of its kind in both the CMOS and bipolar communities and solves a significant portion of the puzzle for predictive modeling of SiGe HBT safe-operating-area (SOA) and reliability.
脉冲应力作用下SiGe HBTs的大电流损伤建模
在SiGe HBTs上进行了大电流脉冲应力测量,以表征损伤行为,并为俄歇热载流子损伤创建了一个全面的基于物理的TCAD损伤模型。利用脉冲应力条件来调节应力作用下器件内部的自加热,使俄歇热载流子产生与经典的混合模损伤和输出平面上的退火解耦。分析了大电流降解的物理特性,提出了一个与温度相关的降解模型。该模型是CMOS和双极社区中同类模型中的第一个,解决了SiGe HBT安全操作区域(SOA)和可靠性预测建模的重要部分难题。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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