K. Mochizuki, T. Nakamura, T. Tanoue, H. Masuda, M. Horiuchi
{"title":"AlGaAs/GaAs HBTs with reduced base-collector capacitance by using buried SiO/sub 2/ and polycrystalline GaAs in the extrinsic base and collector","authors":"K. Mochizuki, T. Nakamura, T. Tanoue, H. Masuda, M. Horiuchi","doi":"10.1109/DRC.1993.1009596","DOIUrl":null,"url":null,"abstract":"Summary form only given. A novel AlGaAs/GaAs HBT (heterojunction bipolar transistor) structure with buried SiO/sub 2/ and polycrystalline GaAs (poly-GaAs) in the extrinsic base and collector is presented. The lower dielectric constant of SiO/sub 2/ and complete carrier depletion of n-type poly-GaAs have reduced the extrinsic component of C/sub BC/ (base-collector capacitance) to 30% while f/sub T/ has been kept high by a thin intrinsic collector. By using newly developed low-resistance p-type poly-GaAs for the base electrode, further reduction in C/sub BC/ is expected with a one-dimensional transistor structure, such as SICOS. >","PeriodicalId":310841,"journal":{"name":"51st Annual Device Research Conference","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"51st Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1993.1009596","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Summary form only given. A novel AlGaAs/GaAs HBT (heterojunction bipolar transistor) structure with buried SiO/sub 2/ and polycrystalline GaAs (poly-GaAs) in the extrinsic base and collector is presented. The lower dielectric constant of SiO/sub 2/ and complete carrier depletion of n-type poly-GaAs have reduced the extrinsic component of C/sub BC/ (base-collector capacitance) to 30% while f/sub T/ has been kept high by a thin intrinsic collector. By using newly developed low-resistance p-type poly-GaAs for the base electrode, further reduction in C/sub BC/ is expected with a one-dimensional transistor structure, such as SICOS. >