An ultra-low-voltage MTCMOS/SIMOX gate array

Abstract

An ultra-low-voltage gate array has been developed using a multi-threshold CMOS (MTCMOS) circuit and separation by implanted oxygen (SIMOX) technology, which is a type of a silicon-on-insulator (SOI) technology. A 250-K basic-cell gate array was fabricated using 0.25-/spl mu/m MTCMOS/SIMOX technology. The gate delay time is 140 ps at 1.2 V and 470 ps at 0.5 V. A 30-KG test circuit was fabricated and the same operating speed as that of 0.5-/spl mu/m at 3.3 V (i.e., 25 MHz) was obtained at 0.58 V with the power consumption reduced to 1/100. At 0.76 V, the operating speed was 40 MHz.