Inverse Masking for Scene-specific Beam Projection

A. Watnik, P. Lebow
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Abstract

Inverse masking allows for scene-specific beam shaping based on discriminators within the initial image. Experimental work to detect an image, encode phase on a spatial modulator, and illuminate specific regions in a scene are performed.
场景特定光束投影的反掩模
反掩模允许基于初始图像内鉴别器的场景特定光束整形。实验工作检测图像,在空间调制器上编码相位,并照亮场景中的特定区域。
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