THz Indium Phosphide Bipolar Transistor Technology

M. Rodwell, J. Rode, H. Chiang, P. Choudhary, T. Reed, E. Bloch, S. Danesgar, H.-C Park, A. Gossard, B. Thibeault, W. Mitchell, M. Urteaga, Z. Griffith, J. Hacker, M. Seo, B. Brar
{"title":"THz Indium Phosphide Bipolar Transistor Technology","authors":"M. Rodwell, J. Rode, H. Chiang, P. Choudhary, T. Reed, E. Bloch, S. Danesgar, H.-C Park, A. Gossard, B. Thibeault, W. Mitchell, M. Urteaga, Z. Griffith, J. Hacker, M. Seo, B. Brar","doi":"10.1109/CSICS.2012.6340091","DOIUrl":null,"url":null,"abstract":"Scaling laws and limits of THz indium Phosphide heterojunction bipolar transistors (HBTs) are presented. The primary limits to scaling through the 32 nm/3 THz node are the resistivity, penetration depth, and current-carrying capability of the emitter and base contacts. A processes flow with refractory dry-etch emitter and base contacts is presented. Beyond the 32 nm node, degenerate injection in the emitter-base junction limits transconductance and impedes scaling. At the 32 nm node, bandwidths will be sufficient for 1.4 THz transmitters and receivers.","PeriodicalId":290079,"journal":{"name":"2012 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","volume":"68 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2012.6340091","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

Abstract

Scaling laws and limits of THz indium Phosphide heterojunction bipolar transistors (HBTs) are presented. The primary limits to scaling through the 32 nm/3 THz node are the resistivity, penetration depth, and current-carrying capability of the emitter and base contacts. A processes flow with refractory dry-etch emitter and base contacts is presented. Beyond the 32 nm node, degenerate injection in the emitter-base junction limits transconductance and impedes scaling. At the 32 nm node, bandwidths will be sufficient for 1.4 THz transmitters and receivers.
太赫兹磷化铟双极晶体管技术
介绍了太赫兹磷化铟异质结双极晶体管(HBTs)的缩放规律和极限。通过32nm / 3thz节点的主要限制是发射极和基极触点的电阻率、穿透深度和载流能力。介绍了一种耐火干蚀刻发射极和基极触点的工艺流程。在32nm节点之外,发射基结中的简并注入限制了跨导性并阻碍了缩放。在32nm节点,带宽将足以满足1.4太赫兹的发射器和接收器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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