A. Bouloukou, B. Boudjelida, A. Sobih, S. Boulay, J. Sly, M. Missous
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引用次数: 10
Abstract
This paper presents the design, fabrication and characterisation of InGaAs-InAlAs pHEMTs suitable for low frequency LNA designs. Transistors with variations in the supply layer thickness or indium concentration are designed to provide for a range of transfer characteristics. Very low levels of leakage, of order of 0.2 muA/mm, are demonstrated by these pHEMTs, which enables the implementation of large-geometry, low-noise devices.