Preliminary Round of OPC Development in 180nm node Silicon Photonics MPW platform

Abstract

Silicon photonic has become an enabling technology in a variety of applications such as telecommunication, datacenter interconnect, LiDAR, optical sensing and quantum computing. However, many research groups or fabless companies lack the access to the manufacturing facilities of silicon photonics devices, which are compatible with the CMOS technology. Multi-project wafer (MPW) service will be an agreeable solution for them. Optical proximity correction (OPC) is essential in silicon photonics MPW platform. In this paper we introduce the preliminary OPC development efforts in CUMEC's 180 nm node silicon photonics MPW platform.