Sub-picowatt retention mode TFET memory for CMOS sensor processing nodes

A. Vladimirescu, C. Anghel, A. Amara, N. Gupta, A. Makosiej
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引用次数: 3

Abstract

This paper describes the applicability of Tunnel FETs (TFET) to ultra-low-power sensor-node embedded Static Random-Access Memories (SRAM). Numerical TCAD device simulations were used first to characterize and optimize the performance of the TFET. The optimized TFETs show a steeper subthreshold slope than CMOS leading to a 5 orders of magnitude reduction in standby current. A look-up table model for circuit simulation of the TFET was developed based on characteristics obtained from TCAD simulations. A TFET SRAM cell is proposed and its performance is analyzed. Our novel 8T TFET SRAM cell operates at Vdd=1V or lower. The Read and Write Static Noise Margins (SNM) are evaluated at 120mV and 200mV, with the operation speed of 3.8GHz and 800MHz Vdd=1V in read and write, respectively. The cell leakage is less than 5fA at Vdd=1V. A sensor node architecture for implementation in a hybrid CMOS/TFET process with a large memory is proposed where the memory consumes as little as 2 fW/cell or 48 pW for a 4 kB array.
用于CMOS传感器处理节点的亚皮瓦保持模式TFET存储器
本文介绍了隧道场效应管(TFET)在超低功耗传感器节点嵌入式静态随机存取存储器(SRAM)中的适用性。首先利用TCAD器件的数值模拟来表征和优化TFET的性能。优化后的tfet显示出比CMOS更陡峭的亚阈值斜率,导致待机电流降低了5个数量级。基于TCAD仿真得到的特性,建立了一种用于晶体管电路仿真的查表模型。提出了一种TFET SRAM单元,并对其性能进行了分析。我们的新型8T TFET SRAM单元在Vdd=1V或更低的电压下工作。在读取和写入工作速度分别为3.8GHz和800MHz Vdd=1V的情况下,在120mV和200mV下评估读和写静态噪声裕度(SNM)。在Vdd=1V时,电池漏液小于5fA。提出了一种用于CMOS/TFET混合大存储器的传感器节点架构,其中存储器功耗低至2fw /cell或4kb阵列的48pw。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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