Evaluation of copper thick film for high frequency digital interconnection

Abstract

Copper thick-film multilayer technology is evaluated for use as a high-frequency digital interconnect in systems with bit rates up to 600 Mb/s. To help design the interconnect, software tools which calculate the electrical parameters and performance for any two-dimensional geometry were developed and are described. The analysis is based on a quasistatic method. A thick-film multilayer test structure with high bandwidth and 50- Omega impedance was realized. The calculated line parameters show good agreement with the measured values.<>