High NA EUV optics: preparing lithography for the next big step

Abstract

To further increase the resolution of EUV scanners ZEISS is working on next generation EUV optics with an increased NA of 0.55. This next generation optics consists of a highly flexible illumination system and projection optics with NA 0.55 to allow scaling beyond the next decade. In this presentation we will present the status of the high-NA optics program at ZEISS. We report on the high NA infrastructure including mirror polishing, coating, surface figure metrology, mirror handling, and integration tooling. Progress in manufacturing of mechanics, frames and mirrors at ZEISS for both illuminator and POB will be shown.