Materials and Device Engineering for High-Performance Gallium Oxide Devices

Zhanbo Xia, N. K. Kalarickal, S. Rajan
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Abstract

Gallium Oxide is an ultra-wide band gap semiconductor that provides key benefits for high-performance power devices, including high electric breakdown field strength, good transport properties, well-controlled doping, and large-area melt-grown native substrates. The unique properties of this material also provide significant opportunities for heterostructure and device engineering. In this paper, we discuss some key advances toward achieving high-performance devices based on Gallium Oxide, and discuss future opportunities and challenges in this exciting area of research.
高性能氧化镓器件的材料与器件工程
氧化镓是一种超宽带隙半导体,为高性能功率器件提供了关键优势,包括高击穿场强,良好的输运特性,良好控制的掺杂和大面积熔融生长的原生衬底。这种材料的独特性质也为异质结构和器件工程提供了重要的机会。在本文中,我们讨论了实现基于氧化镓的高性能器件的一些关键进展,并讨论了这一令人兴奋的研究领域的未来机遇和挑战。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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