N. A. A. Halim, S. K. Sahari, A. A. Hamzah, B. Majlis, S. Marini, L. Hasanah, M. Kashif
{"title":"Activation energy of thermal oxidation germanium oxide on germanium substrates","authors":"N. A. A. Halim, S. K. Sahari, A. A. Hamzah, B. Majlis, S. Marini, L. Hasanah, M. Kashif","doi":"10.1109/SMELEC.2018.8481204","DOIUrl":null,"url":null,"abstract":"The activation energy of GeO2 was studied by determining the oxide thickness versus temperature from lower to higher oxidation temperature in the range between 450°C and 600°C. It was found that a linear relationship can be obtained between oxidation time and oxide thickness for the oxidation temperature between 450 and 575°C while for the 600°C oxidation, a linear relationship can be obtained for the shorter oxidation time. The rate of oxidation increased until 0.55 and abruptly decreased after increasing oxidation temperature to 600°C which implies that the oxygen intermixing occurs during higher oxidation (600°C) rather that diffusion mechanism that leads to the lower activation energy.","PeriodicalId":110608,"journal":{"name":"2018 IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Conference on Semiconductor Electronics (ICSE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMELEC.2018.8481204","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The activation energy of GeO2 was studied by determining the oxide thickness versus temperature from lower to higher oxidation temperature in the range between 450°C and 600°C. It was found that a linear relationship can be obtained between oxidation time and oxide thickness for the oxidation temperature between 450 and 575°C while for the 600°C oxidation, a linear relationship can be obtained for the shorter oxidation time. The rate of oxidation increased until 0.55 and abruptly decreased after increasing oxidation temperature to 600°C which implies that the oxygen intermixing occurs during higher oxidation (600°C) rather that diffusion mechanism that leads to the lower activation energy.