{"title":"Preliminary investigation of an additive approach to the fabrication of precision aspheres","authors":"F. Weber, C. Montcalm, S. Vernon, D. Kania","doi":"10.1364/eul.1996.dfo156","DOIUrl":null,"url":null,"abstract":"We report progress in the aspherization of precision optical substrates via deposition of graded period Mo/Si multilayer coatings using a masking technique. These preliminary results show good agreement between the measured and desired thickness profiles over 85% of the sample, however, thickness deviations of up to 7% are observed in the central area. The errors are attributed to misalignments of the mask relative to the substrate during deposition.","PeriodicalId":201185,"journal":{"name":"Extreme Ultraviolet Lithography (TOPS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-05-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Extreme Ultraviolet Lithography (TOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/eul.1996.dfo156","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We report progress in the aspherization of precision optical substrates via deposition of graded period Mo/Si multilayer coatings using a masking technique. These preliminary results show good agreement between the measured and desired thickness profiles over 85% of the sample, however, thickness deviations of up to 7% are observed in the central area. The errors are attributed to misalignments of the mask relative to the substrate during deposition.