Integrated NMOS Differential Amplifier

M. Almada-Gutierrez, F. Sandoval-Ibarra, R. Sánchez-Fraga
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Abstract

A single-channel integrated differential amplifier has been designed using Negative-channel Metal-Oxide-Semiconductor (NMOS) technology. The main interest is to establish the correct operating point. Following the integrated circuit design flow a schematic circuit is proposed, this is designed from an active voltage divider copies whose reference voltages are 0.25VDD and 0.5VDD whereas VDD = 5 V. The circuit simulation has been realized in Virtuoso considering the level 3 SPICE model, and results show that for proposed dc levels (2.5 V and 1.25 V) the devices work in the saturation region, obtaining a low-frequency gain of 18 dB. Finally, a physical design is realized in Electric VLSI considering specific experiments oriented to Design For Test (DFT) in order to perform the integrated circuit testing using on-wafer measurement equipment.
集成NMOS差分放大器
采用负通道金属氧化物半导体(NMOS)技术设计了一种单通道集成差分放大器。主要的兴趣是建立正确的操作点。根据集成电路设计流程,提出了一个原理图电路,该电路由一个有源分压器副本设计,其参考电压为0.25VDD和0.5VDD,而VDD = 5V。考虑3级SPICE模型,在Virtuoso中实现了电路仿真,结果表明,对于所提出的直流电平(2.5 V和1.25 V),器件工作在饱和区域,获得了18 dB的低频增益。最后,考虑到面向测试设计(DFT)的具体实验,在电子VLSI中实现了物理设计,以便使用片上测量设备进行集成电路测试。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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