{"title":"Epitaxially thin InP Schottky diodes for micromachined polymer membrane-on-silicon coplanar waveguides","authors":"V. Avramescu, K. Hjort","doi":"10.1109/ICIPRM.2002.1014316","DOIUrl":null,"url":null,"abstract":"A new method has been developed to integrate III-V electronic devices into a coplanar waveguide silicon technology. InP dices with an ohmic contact and metal conductor layer are glued to a BCB polymer layer on silicon by using a not fully cured resist and applying pick-'n'-place positioning. An etch stop technique is used to obtain. the epilayer diodes (less than 2 /spl mu/m thick). The Schottky contact is realised with Cr-Au through BCB patterning.","PeriodicalId":145425,"journal":{"name":"Conference Proceedings. 14th Indium Phosphide and Related Materials Conference (Cat. No.02CH37307)","volume":"77 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. 14th Indium Phosphide and Related Materials Conference (Cat. No.02CH37307)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2002.1014316","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A new method has been developed to integrate III-V electronic devices into a coplanar waveguide silicon technology. InP dices with an ohmic contact and metal conductor layer are glued to a BCB polymer layer on silicon by using a not fully cured resist and applying pick-'n'-place positioning. An etch stop technique is used to obtain. the epilayer diodes (less than 2 /spl mu/m thick). The Schottky contact is realised with Cr-Au through BCB patterning.