Epitaxially thin InP Schottky diodes for micromachined polymer membrane-on-silicon coplanar waveguides

V. Avramescu, K. Hjort
{"title":"Epitaxially thin InP Schottky diodes for micromachined polymer membrane-on-silicon coplanar waveguides","authors":"V. Avramescu, K. Hjort","doi":"10.1109/ICIPRM.2002.1014316","DOIUrl":null,"url":null,"abstract":"A new method has been developed to integrate III-V electronic devices into a coplanar waveguide silicon technology. InP dices with an ohmic contact and metal conductor layer are glued to a BCB polymer layer on silicon by using a not fully cured resist and applying pick-'n'-place positioning. An etch stop technique is used to obtain. the epilayer diodes (less than 2 /spl mu/m thick). The Schottky contact is realised with Cr-Au through BCB patterning.","PeriodicalId":145425,"journal":{"name":"Conference Proceedings. 14th Indium Phosphide and Related Materials Conference (Cat. No.02CH37307)","volume":"77 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. 14th Indium Phosphide and Related Materials Conference (Cat. No.02CH37307)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2002.1014316","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

A new method has been developed to integrate III-V electronic devices into a coplanar waveguide silicon technology. InP dices with an ohmic contact and metal conductor layer are glued to a BCB polymer layer on silicon by using a not fully cured resist and applying pick-'n'-place positioning. An etch stop technique is used to obtain. the epilayer diodes (less than 2 /spl mu/m thick). The Schottky contact is realised with Cr-Au through BCB patterning.
外延薄InP肖特基二极管用于微机械聚合物膜硅共面波导
开发了一种将III-V电子器件集成到共面波导硅技术中的新方法。具有欧姆接触和金属导体层的InP器件通过使用未完全固化的抗蚀剂和应用拾取'n'位定位,粘在硅上的BCB聚合物层上。蚀刻停止技术被用来获得。脱毛层二极管(小于2 /spl mu/m厚)。Cr-Au的肖特基接触是通过BCB图案化实现的。
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