Analysis of the impact of random process variations in CMOS tapered buffers

M. Alioto, G. Palumbo, M. Pennisi
{"title":"Analysis of the impact of random process variations in CMOS tapered buffers","authors":"M. Alioto, G. Palumbo, M. Pennisi","doi":"10.1109/ICECS.2009.5410918","DOIUrl":null,"url":null,"abstract":"In this paper, the effect of intradie process variations on the delay of tapered buffers designed in static CMOS logic style is analyzed in depth. An analytical delay model accounting for the dependency of variations on transistor sizing, load and input capacitance requirement is derived for the single stage. Then, this model is extended to the case of N-stage tapered buffers. The closed-form delay expressions including the contribution of intradie variations permit to gain an insight into the impact of process variations on the performance of tapered buffers. Monte Carlo simulations on a 90-nm technology including layout parasitics are performed to validate the analysis. Results are shown to agree well with the expressions derived, thereby confirming the validity of the underlying assumptions, as well as the suitability of the proposed models for design purposes.","PeriodicalId":343974,"journal":{"name":"2009 16th IEEE International Conference on Electronics, Circuits and Systems - (ICECS 2009)","volume":"61 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 16th IEEE International Conference on Electronics, Circuits and Systems - (ICECS 2009)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICECS.2009.5410918","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

In this paper, the effect of intradie process variations on the delay of tapered buffers designed in static CMOS logic style is analyzed in depth. An analytical delay model accounting for the dependency of variations on transistor sizing, load and input capacitance requirement is derived for the single stage. Then, this model is extended to the case of N-stage tapered buffers. The closed-form delay expressions including the contribution of intradie variations permit to gain an insight into the impact of process variations on the performance of tapered buffers. Monte Carlo simulations on a 90-nm technology including layout parasitics are performed to validate the analysis. Results are shown to agree well with the expressions derived, thereby confirming the validity of the underlying assumptions, as well as the suitability of the proposed models for design purposes.
随机工艺变化对CMOS锥形缓冲器的影响分析
本文深入分析了以静态CMOS逻辑方式设计的锥形缓冲器的模内工艺变化对延时的影响。对于单级,推导了考虑晶体管尺寸、负载和输入电容要求变化的解析延迟模型。然后,将该模型推广到n级锥形缓冲器的情况。封闭形式的延迟表达式包括模具内部变化的贡献,允许深入了解工艺变化对锥形缓冲器性能的影响。在包含布局寄生的90纳米工艺上进行了蒙特卡罗仿真以验证分析。结果与推导出的表达式一致,从而证实了基本假设的有效性,以及所提出的模型对设计目的的适用性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信