Investigation of SRAM using BTI-aware statistical compact models

J. Ding, D. Reid, C. Millar, A. Asenov
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引用次数: 3

Abstract

In this paper, statistical variability and different levels of BTI degradation are introduced into a compact model by statistical parameter extraction. Static Random Access Memory (SRAM) is used to test the compact model and to investigate the effects of MOSFET statistical variability and degradation at circuit level. Statistical distributions of Static Noise Margin (SNM) under different scenarios representing various degradation levels as well as mismatch levels between `on' and the rest of the SRAM cell transistors are compared to investigate their impacts on SRAM stability. A surface response model of the dependence of the mean and standard deviation of SNM on circuit ageing and transient stress is also developed to quickly evaluate SRAM stability at arbitrary degradation levels.
基于bti感知统计紧凑模型的SRAM研究
本文通过统计参数提取,将统计变异性和不同程度的BTI退化引入到一个紧凑模型中。静态随机存取存储器(SRAM)用于测试紧凑模型,并在电路水平上研究MOSFET统计变异性和退化的影响。在不同情况下,静态噪声裕度(SNM)的统计分布代表了不同的退化水平,以及SRAM单元晶体管的“on”和其余部分之间的不匹配水平,以研究它们对SRAM稳定性的影响。为了快速评估SRAM在任意退化水平下的稳定性,还建立了SNM均值和标准差与电路老化和瞬态应力关系的表面响应模型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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