How does phonon generation influence AlGaN/GaN HFETs?- Transient and steady state studies

Yuh‐Renn Wu, Jasprit Singh
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The time period between Ins-200ns and steady state temperature variation have been studied. The study shows self-heating effect may not be easily removed even with very short pulse length( 3ns). Our result explains part of the reason why low velocity still observed in the velocity-electrical field(v-E) measurement with very short pulse. The relation of current, power and temperature with time evolution will be addressed in this paper. To study the time dependent self-heating effect, we need to include the two-dimensional(2D) time dependent thermal conduction equation into our theoretical model. The thermal conduction equation is coupled into our developed 2D finite element (FEM) Poisson and continuity equation[3] to solve the current and potential self-iteratively at each time step. Figure l(a) shows typical two terminals device used for v-E measurement. The channel length is 1.6 ,um. The GaN buffer layer is 3,um and SiC substrate is assumed to be 100,um in this simulation. The mobility model is calculated from the Monte Carlo program[4] with different temperature as shown in Fig. l(b). This mobility model is then used to calculate the current with different temperature in the channel. The materials parameters used for thermal conduction equations are listed in Table I. Figure 2 shows the simulated temperature distribution in the device for two different time steps. The GaN buffer layer thickness is 3,um. As shown in the figure, at t = 10 ns, the heat generated in the channel has not have a chance to propagate to the GaN/SiC interface. This suggests that for the short pulse period, the substrate does not play any role to assist the removal of heat. Figure 3 shows the relationships of power density and temperature increase with time. The calculation shows the heating time constants are around a few nano second ranges. The average channel temperature still increases around 20K to 70K even at 2ns pulse for different power density. The thermal resistance obtained from 2D simulation is around 8.6 K mm/W, which is suitable for wide channel width cases because it does not consider the heat dissipation parallel to the channel width. Figure 4 shows the current density and temperature versus time for different VDSS. When the drain voltage increases, We observed a rapid decrease of current at t < 5ns. The temperature in the channel increases 150K and current drops 25% at t = 5 ns for VDS is equal to 20V. The decrease rate of current at t > 100 ns becomes very small compared to the current drops within 5ns. This simulation results suggest that if we use the short pulse ranges from l,us to 100 ns, to measure the v-E curves, we might get wrong conclusion that self-heating effect is completely removed since the current does not change too much within this region. Figure 5 shows the simulated v-E for different pulse length. The result shows that even for 3ns pulse, the velocity still has significant drop especially in the high field region. For the pulse length around 200ns, which is the typical pulse length used for I-V curves measurement of AlGaN/GaN HFET, the saturation velocity goes to 1.25 x 107 cm/s. This value is very close to velocity extracted from extrinsic fT measurement and is probably part of the reasons for lower expected current. More of simulation results will be presented in this talk and compared with experimental work in the future. In conclusion, our simulation results suggest that self-heating effect can not be completely removed even at very short pulse range (3ns). Better device engineering is needed to reduce the self-heating effect. The extraction of hot-phonon life time should be calibrated by the actual channel temperature for different pulse length instead of ambient temperature.","PeriodicalId":259981,"journal":{"name":"2006 64th Device Research Conference","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 64th Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2006.305140","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

AlGaN/GaN HFETs are high power device where power dissipation reaching more than 20 W/mm is not uncommon. What is the role of self-heating (equilibrium and non-equilibrium) and how does it influence device characterization and device performance? Traditionally the self-heating effect is assumed to be removed by using very short pulse current measurement and the fitting of hot phonon life time is then calculated based on this assumption[l], [2]. In order to check this assumption, we have developed two dimensional(2D) time dependent thermal conduction equation coupled with our 2D Poisson and driftdiffusion equation solver to study the temperature evolution in time domain for the nitride HFET. The time period between Ins-200ns and steady state temperature variation have been studied. The study shows self-heating effect may not be easily removed even with very short pulse length( 3ns). Our result explains part of the reason why low velocity still observed in the velocity-electrical field(v-E) measurement with very short pulse. The relation of current, power and temperature with time evolution will be addressed in this paper. To study the time dependent self-heating effect, we need to include the two-dimensional(2D) time dependent thermal conduction equation into our theoretical model. The thermal conduction equation is coupled into our developed 2D finite element (FEM) Poisson and continuity equation[3] to solve the current and potential self-iteratively at each time step. Figure l(a) shows typical two terminals device used for v-E measurement. The channel length is 1.6 ,um. The GaN buffer layer is 3,um and SiC substrate is assumed to be 100,um in this simulation. The mobility model is calculated from the Monte Carlo program[4] with different temperature as shown in Fig. l(b). This mobility model is then used to calculate the current with different temperature in the channel. The materials parameters used for thermal conduction equations are listed in Table I. Figure 2 shows the simulated temperature distribution in the device for two different time steps. The GaN buffer layer thickness is 3,um. As shown in the figure, at t = 10 ns, the heat generated in the channel has not have a chance to propagate to the GaN/SiC interface. This suggests that for the short pulse period, the substrate does not play any role to assist the removal of heat. Figure 3 shows the relationships of power density and temperature increase with time. The calculation shows the heating time constants are around a few nano second ranges. The average channel temperature still increases around 20K to 70K even at 2ns pulse for different power density. The thermal resistance obtained from 2D simulation is around 8.6 K mm/W, which is suitable for wide channel width cases because it does not consider the heat dissipation parallel to the channel width. Figure 4 shows the current density and temperature versus time for different VDSS. When the drain voltage increases, We observed a rapid decrease of current at t < 5ns. The temperature in the channel increases 150K and current drops 25% at t = 5 ns for VDS is equal to 20V. The decrease rate of current at t > 100 ns becomes very small compared to the current drops within 5ns. This simulation results suggest that if we use the short pulse ranges from l,us to 100 ns, to measure the v-E curves, we might get wrong conclusion that self-heating effect is completely removed since the current does not change too much within this region. Figure 5 shows the simulated v-E for different pulse length. The result shows that even for 3ns pulse, the velocity still has significant drop especially in the high field region. For the pulse length around 200ns, which is the typical pulse length used for I-V curves measurement of AlGaN/GaN HFET, the saturation velocity goes to 1.25 x 107 cm/s. This value is very close to velocity extracted from extrinsic fT measurement and is probably part of the reasons for lower expected current. More of simulation results will be presented in this talk and compared with experimental work in the future. In conclusion, our simulation results suggest that self-heating effect can not be completely removed even at very short pulse range (3ns). Better device engineering is needed to reduce the self-heating effect. The extraction of hot-phonon life time should be calibrated by the actual channel temperature for different pulse length instead of ambient temperature.
声子的产生如何影响AlGaN/GaN hfet ?-瞬态和稳态研究
AlGaN/GaN hfet是高功率器件,其功耗达到20w /mm以上的情况并不少见。自热(平衡和非平衡)的作用是什么?它如何影响器件特性和器件性能?传统上假定用极短脉冲电流测量可以消除自热效应,并以此假设计算热声子寿命的拟合[1],[2]。为了验证这一假设,我们建立了二维(2D)时间相关的热传导方程,并结合二维泊松方程和漂移扩散方程求解器来研究氮化物HFET的时域温度演变。研究了从Ins-200ns到稳态温度变化的时间间隔。研究表明,即使脉冲长度很短(3ns),自热效应也不容易消除。我们的结果解释了在极短脉冲速度电场(v-E)测量中仍然观察到低速度的部分原因。本文将讨论电流、功率和温度随时间变化的关系。为了研究随时间变化的自热效应,我们需要将二维随时间变化的热传导方程纳入我们的理论模型。将热传导方程耦合到我们开发的二维有限元泊松方程和连续性方程[3]中,在每个时间步自迭代地求解电流和势。图1 (a)显示了用于v-E测量的典型双端子装置。通道长度是1.6。在模拟中,GaN缓冲层为3um, SiC衬底为100um。迁移率模型由蒙特卡罗程序[4]在不同温度下计算得出,如图1 (b)所示。利用该迁移率模型计算了不同温度下通道内的电流。热传导方程所使用的材料参数列于表1。图2为两种不同时间步长的模拟温度在器件内的分布。GaN缓冲层厚度为3,um。如图所示,在t = 10 ns时,通道中产生的热量还没有机会传播到GaN/SiC界面。这表明,对于短脉冲周期,基材不发挥任何作用,以协助去除热量。图3显示了功率密度和温度随时间升高的关系。计算表明,加热时间常数在几个纳秒范围内。在不同的功率密度下,即使在2ns脉冲下,平均通道温度仍在20K ~ 70K左右升高。二维模拟得到的热阻约为8.6 K mm/W,由于不考虑与通道宽度平行的散热,适合于宽通道宽度的情况。图4显示了不同VDSS的电流密度和温度与时间的关系。当漏极电压增加时,我们观察到电流在t < 5ns时迅速减小。当VDS = 20V时,t = 5ns时通道内温度升高150K,电流下降25%。与5ns内的电流下降相比,t > 100 ns时的电流下降率非常小。这一模拟结果表明,如果我们使用1 ~ 100 ns的短脉冲范围来测量v-E曲线,我们可能会得到自热效应完全消除的错误结论,因为在该区域内电流变化不大。图5显示了不同脉冲长度下的模拟v-E。结果表明,即使是3ns脉冲,速度仍然有明显的下降,特别是在高场区域。当脉冲长度为200ns左右,即AlGaN/GaN HFET的典型I-V曲线测量脉冲长度时,饱和速度达到1.25 × 107 cm/s。这个值非常接近从外部fT测量中提取的速度,这可能是预期电流较低的部分原因。更多的模拟结果将在本次讲座中展示,并与实验工作进行比较。综上所述,我们的模拟结果表明,即使在很短的脉冲范围(3ns)下,自热效应也不能完全消除。需要更好的设备工程来降低自热效应。热声子寿命的提取应根据不同脉冲长度下的实际通道温度而不是环境温度进行校准。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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