Analysis and modeling of skin and proximity effects for millimeter-wave inductors design in nanoscale Si CMOS

R. Chan, Jyh-Chyurn Guo
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引用次数: 13

Abstract

Analytical models of skin effect and proximity effect were developed in this paper to calculate and predict the frequency dependent resistance, Re(Zin) and Q for mm-wave inductor design. The derived models incorporate layout and material parameters, and frequency in an explicit form suitable for circuit simulation. The accuracy has been proven by a close match with Re(Zin) and Q measured from mm-wave inductor (Ldc~150pH, Qmax ~17, fSR>>65GHz) fabricated by 65nm CMOS process with 0.9μm standard top metal.
纳米级硅CMOS毫米波电感设计中的趋肤效应和接近效应分析与建模
本文建立了集肤效应和邻近效应的解析模型,用于计算和预测毫米波电感的频率相关电阻、Re(Zin)和Q。导出的模型以适合电路仿真的显式形式包含布局、材料参数和频率。用0.9μm标准顶金属,采用65nm CMOS工艺制作的毫米波电感(Ldc~150pH, Qmax ~17, fSR>>65GHz)测得的Re(Zin)和Q值与测量结果吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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