Fabrication and Performance Test of Fresnel Zone Plate with 35 nm Outermost Zone Width in Hard X-Ray Region

Yoshio Suzuki, A. Takeuchi, H. Takenaka, I. Okada
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引用次数: 23

Abstract

A Fresnel zone plate (FZP) with 35 nm outermost zone width has been fabricated and tested in the hard X-ray region. The FZP was made by electron beam lithography and reactive ion etching technique. The performance test of the FZP was carried out by measuring the focused beam profile for coherent hard X-ray beam at the beamline 20XU of SPring-8. The full width at half maximum of the focused beam profile measured by knife-edge scan method is 34.9±2.7 nm, that agrees well with the theoretical value of diffraction-limited resolution. Applications to scanning microscopy were also carried out.
硬x射线区外宽35 nm菲涅耳带片的制备及性能测试
制作了最外层带宽为35 nm的菲涅耳带板,并在硬x射线区进行了测试。利用电子束光刻和反应离子刻蚀技术制备了FZP。通过测量SPring-8光束线20XU处相干硬x射线的聚焦光束轮廓,对FZP进行了性能测试。刀口扫描法测得的聚焦光束剖面半最大值全宽度为34.9±2.7 nm,与衍射极限分辨率理论值吻合较好。应用于扫描显微镜也进行了。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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