IR photoconductivity of β-CuPc/poly (NVK-BMA)

Abstract

Poly(N-vinylcarbazole) (PVK) is well known as an electron donor with classical stiffness. In contrast, the monomer butyl methacrylate (BMA), being an electron acceptor, possesses a flexible side group, which may be used as an internal plasticizer. The NVK-BMA system is therefore easy to be copolymerized with the restraint of hompolymerization of NVK; its mechanical and technological properties will naturally be improved. The question is whether the photoconductivity of the copolymer, especially in the IR region, will be enhanced.