Characterization of domain switching behavior of MTJ cells using magnetic force microscopy(MFM) and H-R loop analysis

J. Heo, Kyohyeok Kim, Taewan Kim, I. Chung
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引用次数: 1

Abstract

Correlationship between electrical and magnetic properties of magnetic tunnel junction (MTJ) for Magnetic Random Access Memory(MRAM) was studied. MTJ (Ta/NiFeCr/PtMn/CoFe/Ru/CoFe/AlOx/CoFe/NiFe/Ta) was analyzed utilizing H-R loop and MFM images. We verified that the kink in H-MR loop comes from the vortex domain of free layer. In addition, we also observed a close relationship between domain switching behavior and anomalous H-R curve. These results would be useful for characterization of MTJ cell, thereby optimizing the process to realize the ultra high density MRAM.
利用磁力显微镜(MFM)和H-R环分析表征MTJ细胞的畴切换行为
研究了磁随机存储器(MRAM)中磁隧道结(MTJ)的电学性能和磁学性能的相关性。利用H-R环和MFM图像分析MTJ (Ta/NiFeCr/PtMn/CoFe/Ru/CoFe/AlOx/CoFe/NiFe/Ta)。我们验证了H-MR环中的扭结来自于自由层的涡域。此外,我们还观察到畴切换行为与异常H-R曲线之间的密切关系。这些结果将有助于MTJ细胞的表征,从而优化工艺以实现超高密度的MRAM。
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