{"title":"Characterization of domain switching behavior of MTJ cells using magnetic force microscopy(MFM) and H-R loop analysis","authors":"J. Heo, Kyohyeok Kim, Taewan Kim, I. Chung","doi":"10.1109/NMDC.2006.4388931","DOIUrl":null,"url":null,"abstract":"Correlationship between electrical and magnetic properties of magnetic tunnel junction (MTJ) for Magnetic Random Access Memory(MRAM) was studied. MTJ (Ta/NiFeCr/PtMn/CoFe/Ru/CoFe/AlOx/CoFe/NiFe/Ta) was analyzed utilizing H-R loop and MFM images. We verified that the kink in H-MR loop comes from the vortex domain of free layer. In addition, we also observed a close relationship between domain switching behavior and anomalous H-R curve. These results would be useful for characterization of MTJ cell, thereby optimizing the process to realize the ultra high density MRAM.","PeriodicalId":200163,"journal":{"name":"2006 IEEE Nanotechnology Materials and Devices Conference","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE Nanotechnology Materials and Devices Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NMDC.2006.4388931","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Correlationship between electrical and magnetic properties of magnetic tunnel junction (MTJ) for Magnetic Random Access Memory(MRAM) was studied. MTJ (Ta/NiFeCr/PtMn/CoFe/Ru/CoFe/AlOx/CoFe/NiFe/Ta) was analyzed utilizing H-R loop and MFM images. We verified that the kink in H-MR loop comes from the vortex domain of free layer. In addition, we also observed a close relationship between domain switching behavior and anomalous H-R curve. These results would be useful for characterization of MTJ cell, thereby optimizing the process to realize the ultra high density MRAM.