Ultraviolet-to-infrared dual-band detectors based on quantum dot and heterojunction structures

A. Perera
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Abstract

Tunneling quantum dot photodetector (T-QDIP) structures designed for multi-band infrared and heterojunction detectors for ultraviolet (UV) to infrared (IR) radiation detection are presented. In T-QDIPs, photoabsorption takes place in InGaAs QDs due to intersubband transitions of carriers. Photoexcited carriers are selectively collected through resonant tunneling, while the dark current is blocked by AlGaAs/InGaAs tunneling barriers. This approach to block dark current without reducing photocurrent was observed in a detector responding at ~ 6 and ~ 17 μm up to 300 K. In addition, UV/IR dual-band detectors were developed based on GaN/AlGaN Heterojunction Interfacial Workfunction Internal Photoemission (HEIWIP) structures. A typical HEIWIP detector structure consists of a single (or series of) doped emitter(s) followed by an undoped barrier(s) between two highly doped contact layers. Reported UV/IR structures use n-doped GaN emitters and AlxGa1-xN barriers. The UV response is due to interband (valence-to-conduction) transitions in the undoped AlGaN barrier, while the IR response arises from intraband transitions in the n-doped GaN emitter. Preliminary detectors were successfully demonstrated with a 360 nm threshold UV response up to 300 K and 8-14 μm IR response up to 80 K.
基于量子点和异质结结构的紫外-红外双波段探测器
提出了用于多波段红外探测的隧道量子点光电探测器(T-QDIP)结构和用于紫外-红外辐射探测的异质结探测器。在t - qdip中,由于载流子的子带间跃迁,InGaAs量子点发生光吸收。光激发载流子通过共振隧穿选择性收集,暗电流被AlGaAs/InGaAs隧穿势垒阻挡。在响应于~ 6和~ 17 μm、高达300 K的检测器中观察到这种阻断暗电流而不减小光电流的方法。此外,基于GaN/AlGaN异质结界面工作函数内光电发射(HEIWIP)结构开发了紫外/红外双频探测器。典型的hewip探测器结构由单个(或一系列)掺杂发射极组成,其后是两个高掺杂接触层之间的未掺杂势垒。报道的UV/IR结构使用n掺杂的GaN发射器和AlxGa1-xN势垒。紫外响应是由于未掺杂的氮化镓势垒的带间(价-导)跃迁,而红外响应是由氮掺杂氮化镓发射极的带内跃迁引起的。初步验证了360 nm阈值紫外响应高达300 K, 8-14 μm红外响应高达80 K。
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