Particle-Growth Caused By Film Deposition In VLSI Manufacturing Process

Abstract

A new method for forming imaginary-particles with various sizes and materials was developed, and particle growth caused by film deposition in VLSI manufacturing process was investigated by using imaginary-particles. Consequently, particle growth was strongly dependent on film thickness and step-coverage decided by film deposition method, and the study with imaginary-particles was very effective to explicate the particle growth mechanism.