S. Kawabata, Mitsuru Nakura, S. Yamazaki, T. Shibuya, Y. Inoue, Junya Onishi, Yoshiaki Tabuchi, Y. Tamai, Y. Yaoi, K. Ishihara, Y. Ohta, H. Shima, H. Akinaga, Natsuki Fukuda, Hidenao Kurihara, Yoshiaki Yoshida, Y. Kokaze, Y. Nishioka, K. Suu, K. Nakayama, A. Kitagawa, S. Ohnishi, N. Awaya
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引用次数: 6
Abstract
This paper presents the process integration and device technology for the Resistance RAM(RRAM) memory array using a CoOx film and a recess structure as a resistor, which is capable of low voltage, high speed and low current operation. The resistance of the CoOx film and its uniformity are strongly dependent on the film quality, which is optimized by controlling the O2 gas flow rate during the film deposition. We demonstrate the basic write and read operation of the 128Kbits memory array by developing the novel process integration technology and optimizing the test algorism.
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