Electron beam detection of cobalt trench embedded voids enabling improved process control for Middle-Of-Line at the 7nm node and beyond

N. Breil, D. Shemesh, J. Fernandez, R. Hung, N. Bekiaris, J. Tseng, M. Naik, J. H. Park, J. Bakke, A. Kumar, K. Nafisi, A. Litman, A. Karnieli, V. Kuchik, A. Wachs, N. Khasgiwale, M. Chudzik
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引用次数: 1

Abstract

Inline detection of embedded voids within Middle-Of-Line (MOL) cobalt metal lines is a major industry gap at 7nm technology node and below, for both developing the new metallization solutions, as well as for monitoring during ramp and production. We present a new non-destructive electron beam cobalt void detection method, leveraging an improved scanning electron microscope (SEM) imaging technique, which enable an accurate detection of voids embedded inside MOL metal trenches. After explaining the potential process mechanisms causing void formation, we introduce the e-beam technique, and demonstrate by simulation and experiments the correlation between the electron signal and the volume and depth of the voids. We conclude this paper by discussing how a defect inspection strategy using a massive metrology approach can lead to a faster and more efficient development of the Cobalt metallization.
电子束检测钴沟槽嵌入的空隙,从而改善了在7nm及以上节点的中线工艺控制
对于开发新的金属化解决方案,以及在斜坡和生产过程中进行监控而言,在线检测中线(MOL)钴金属线中的嵌入式空隙是7nm及以下技术节点的主要行业空白。我们提出了一种新的非破坏性电子束钴空洞检测方法,利用改进的扫描电子显微镜(SEM)成像技术,能够准确检测嵌入在MOL金属沟槽中的空洞。在解释了导致空洞形成的潜在过程机制之后,我们介绍了电子束技术,并通过模拟和实验证明了电子信号与空洞的体积和深度之间的相关性。我们通过讨论使用大规模计量方法的缺陷检测策略如何导致钴金属化更快,更有效的发展来结束本文。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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