T. Kaieda, P. Kladitis, G. Kading, L. Brott, F. D. Allen, J. Parish
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引用次数: 0
Abstract
Large pixel areas with thick film suspensions on a solid substrate have been shown to change resistivity when measured at different substrate temperatures. Microsized pixel areas with thinner suspensions on a thermally isolating silicon micromachined structure have demonstrated the same decrease in resistivity when exposed to infrared radiation