Advancement in cermet thick film technology for dry circuit applications

R.M. Bolin, W. Bosze
{"title":"Advancement in cermet thick film technology for dry circuit applications","authors":"R.M. Bolin, W. Bosze","doi":"10.1109/HOLM.1988.16125","DOIUrl":null,"url":null,"abstract":"The primary limiting factor of the variable resistors presently available for operation in the low microampere range is output instability as a result of changes in contact resistance. These changes result from nonconductive films and dielectrics forming over time between the resistor element and wiper contact. The authors discuss a novel cermet technology that greatly reduces the effects of contact resistance, namely, recently developed Palirium system that improves output stability by creating a precious metal to metal contact point between the resistor's element and the wiper.<<ETX>>","PeriodicalId":191800,"journal":{"name":"Electrical Contacts, 1988., Proceedings of the Thirty Fourth Meeting of the IEEE Holm Conference on Electrical Contacts","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrical Contacts, 1988., Proceedings of the Thirty Fourth Meeting of the IEEE Holm Conference on Electrical Contacts","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HOLM.1988.16125","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The primary limiting factor of the variable resistors presently available for operation in the low microampere range is output instability as a result of changes in contact resistance. These changes result from nonconductive films and dielectrics forming over time between the resistor element and wiper contact. The authors discuss a novel cermet technology that greatly reduces the effects of contact resistance, namely, recently developed Palirium system that improves output stability by creating a precious metal to metal contact point between the resistor's element and the wiper.<>
干电路用金属陶瓷厚膜技术的进展
目前可用于在低微安培范围内工作的可变电阻的主要限制因素是由于接触电阻变化而导致的输出不稳定。这些变化是由于电阻元件和雨刷接触之间的非导电膜和电介质随着时间的推移而形成的。作者讨论了一种新型金属陶瓷技术,该技术大大降低了接触电阻的影响,即最近开发的palrium系统,该系统通过在电阻器元件和雨刷器之间创建贵金属对金属接触点来提高输出稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信