{"title":"32% Slew rate and 27% data rate improved 2×VDD output buffer using PVTL compensation","authors":"Tzung-Je Lee, Kai-Wei Ruan, Chua-Chin Wang","doi":"10.1109/ICICDT.2014.6838601","DOIUrl":null,"url":null,"abstract":"A 2×VDD Output Buffer using PVTL compensation is proposed in this paper. Beside the PVT compensation, a Leakage compensation circuit is employed. With the proposed Leakage compensation circuit, the SR (slew rate) and data rate are improved by 32% and 27%, respectively, for VDDIO = 1.8 V at the worst case. Moreover, the reliability problem caused by the unstable voltage, gate oxide overstress and hot carrier degradation is avoided. The proposed design is implemented using a typical 90 nm CMOS process. The core area is 0.425 mm × 0.0563 mm. The SR is simulated to be 1.3-3.0 V/ns. The data rate is simulated to be 454, 370, and 500 MHz for VDDIO = 1.8, 1.2, and 1.0 V, respectively.","PeriodicalId":325020,"journal":{"name":"2014 IEEE International Conference on IC Design & Technology","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE International Conference on IC Design & Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICICDT.2014.6838601","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
A 2×VDD Output Buffer using PVTL compensation is proposed in this paper. Beside the PVT compensation, a Leakage compensation circuit is employed. With the proposed Leakage compensation circuit, the SR (slew rate) and data rate are improved by 32% and 27%, respectively, for VDDIO = 1.8 V at the worst case. Moreover, the reliability problem caused by the unstable voltage, gate oxide overstress and hot carrier degradation is avoided. The proposed design is implemented using a typical 90 nm CMOS process. The core area is 0.425 mm × 0.0563 mm. The SR is simulated to be 1.3-3.0 V/ns. The data rate is simulated to be 454, 370, and 500 MHz for VDDIO = 1.8, 1.2, and 1.0 V, respectively.