Comprehensive investigation and design of Tunnel FET-based SRAM

Hao Zhu, Qianqian Huang, Lingyi Guo, Libo Yang, Ye Le, Ru Huang
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Abstract

In this work, the impacts of electrical characteristics of Tunnel FET (TFET) on the SRAM design are systemically investigated for the first time from the perspective of memory array. A novel 10T TFET SRAM design is also proposed to overcome the challenges and improve the circuit stability. By using a calibrated compact model, the simulated static power of 10T TFET SRAM can be much lower than traditional 6T MOSFET SRAM, especially at the low supply voltage of 0.5V. In addition, the cell's stability is also largely improved with the largest noise margin compared with reported 7T TFET SRAM design and traditional 6T MOSFET SRAM.
基于隧道场效应效应的SRAM综合研究与设计
本文首次从存储阵列的角度系统地研究了隧道场效应晶体管(TFET)的电特性对SRAM设计的影响。为了克服这些挑战,提高电路的稳定性,提出了一种新颖的10T TFET SRAM设计。通过使用校准的紧凑模型,10T TFET SRAM的模拟静态功率可以大大低于传统的6T MOSFET SRAM,特别是在0.5V的低电源电压下。此外,与已有报道的7T TFET SRAM设计和传统的6T MOSFET SRAM相比,该电池的稳定性也得到了很大改善,噪声裕度最大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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