Correction of iso-focal tilt in phase edge lithography by adjustment of primary spherical aberration

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872611

S. Nakao, K. Tsujita, I. Arimoto, W. Wakamiya

引用次数: 0

Abstract

It is revealed by optical image calculations that iso-focal tilt in phase edge lithography can be corrected by adjustment of primary spherical aberration. Tolerant range of the adjustment is /spl sim/0.02 wave. Moreover, DOF becomes larger than that in ideal optics under corrected spherical aberrations with large RMS-OPD of /spl sim/0.66 wave.

查看原文本刊更多论文

利用一次球差校正相位边缘光刻等焦倾斜

光学图像计算表明，相位边缘光刻的等焦倾斜可以通过调整一次球差进行校正。调节的容忍范围为/spl sim/0.02波。在球差校正后，RMS-OPD为/spl sim/0.66波时，DOF比理想光学大。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

自引率

0.00%

发文量