Enhanced thermal performance of lifted AlGaAs HBT's bonded onto natural diamond substrates

V. Arbet-Engels, W. Chang, E. Yablonovitch, G. Sullivan, M. Szwed, M. Chang
{"title":"Enhanced thermal performance of lifted AlGaAs HBT's bonded onto natural diamond substrates","authors":"V. Arbet-Engels, W. Chang, E. Yablonovitch, G. Sullivan, M. Szwed, M. Chang","doi":"10.1109/DRC.1994.1009430","DOIUrl":null,"url":null,"abstract":"The IC industry lias rcaclicd tlic tlircsliold wlicrc tlic device pcrformance is limitcd by traditional packaging concepts. For instance, tlie trend toward higher frequcncy operation of GaAs/AlGaAs Iieterqjunction bipolar transistors (HBT) lias manifested itself in the ever increasing nced for ncw packaging systems in ordcr to lower tlie thermal resistance ’I?. In particular. devices grown on semi-insulating GaAs substrates suffer to ii grcalcr cstcnt due to the poor thermal conductivity of 111-V compounds. In Silicon IC technology, liowevcr. llicse limitations are not as severe. due to the approsinlately 2.7 tiines larger thermal conductivity of Si respect to GaAs. Nevertheless, recent developments in thin film handling and processing technology have created new vistas for inovative packaging solutions. For esamplc, using tlie epitasial liftoff (ELO) technique ’. active layers of clcctronic circuitry can be isolated from their substrates on which they were synthesized and hrtl ier mounted onto diffcrcnt substratcs with suitable thermal properties.","PeriodicalId":244069,"journal":{"name":"52nd Annual Device Research Conference","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"52nd Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1994.1009430","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The IC industry lias rcaclicd tlic tlircsliold wlicrc tlic device pcrformance is limitcd by traditional packaging concepts. For instance, tlie trend toward higher frequcncy operation of GaAs/AlGaAs Iieterqjunction bipolar transistors (HBT) lias manifested itself in the ever increasing nced for ncw packaging systems in ordcr to lower tlie thermal resistance ’I?. In particular. devices grown on semi-insulating GaAs substrates suffer to ii grcalcr cstcnt due to the poor thermal conductivity of 111-V compounds. In Silicon IC technology, liowevcr. llicse limitations are not as severe. due to the approsinlately 2.7 tiines larger thermal conductivity of Si respect to GaAs. Nevertheless, recent developments in thin film handling and processing technology have created new vistas for inovative packaging solutions. For esamplc, using tlie epitasial liftoff (ELO) technique ’. active layers of clcctronic circuitry can be isolated from their substrates on which they were synthesized and hrtl ier mounted onto diffcrcnt substratcs with suitable thermal properties.
提升AlGaAs HBT在天然金刚石基体上的热性能
集成电路行业的传统封装理念限制了IC器件的性能。例如,GaAs/AlGaAs双极晶体管(HBT)的高频工作趋势体现在为了降低热阻' I '而对新型封装系统的需求不断增加。在特定的。在半绝缘GaAs衬底上生长的器件由于111-V化合物的导热性差而遭受ii calcst。然而,在硅集成电路技术中。许可证限制没有那么严格。由于硅的导热系数比砷化镓高约2.7倍。然而,薄膜处理和加工技术的最新发展为创新包装解决方案创造了新的前景。例如,采用薄膜外延升空(ELO)技术。电子电路的有源层可以与它们合成的基板隔离,并安装在具有合适热性能的不同基板上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信