A new inspection method for PSM on DUV inspection light source

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-31 DOI:10.1109/IMNC.2001.984070

I. Isomura, H. Tsuchiya, S. Sugihara, K. Yamashita, M. Tabata

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Abstract

For the 130 nm generation, the Phase Shift Mask (PSM) is expected to be widely used. Moreover, demand for higher transmission PSM is increasing and a mask inspection system with high detection sensitivity for these masks is also required. In this paper, a new inspection method to improve defect detection sensitivity for a PSM in the DUV inspection system is discussed.

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基于DUV检测光源的PSM检测新方法

对于130纳米一代，相移掩模(PSM)有望得到广泛应用。此外，对高透射率PSM的需求正在增加，并且还需要对这些掩模具有高检测灵敏度的掩模检测系统。本文讨论了一种新的检测方法，以提高DUV检测系统中PSM的缺陷检测灵敏度。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

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