{"title":"The potentialities of the plasmachemical technology for fabrication of silica-based photosensitive optical fibers","authors":"K. Golant, E. Dianov","doi":"10.1364/bgppf.1997.jsue.4","DOIUrl":null,"url":null,"abstract":"Irreversible refractive index changes in silica-based optical fibers under the action of UV radiation (photorefractive effect) are associated with the presence of oxygen vacancies in the core glass (Si-ODC & Ge-ODC). Although the microscopic mechanism of the photorefractive effect has not been established in detail, it is Ge-ODC that ensure UV light delivery into the fiber core owing to their strong absorption band centered at 242 nm. Naturally, one of the ways of increasing photosensitivity of silica-based fibers is optimization of the preform fabrication regimes with a view to maximize the Ge-ODC concentration.","PeriodicalId":182420,"journal":{"name":"Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/bgppf.1997.jsue.4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Irreversible refractive index changes in silica-based optical fibers under the action of UV radiation (photorefractive effect) are associated with the presence of oxygen vacancies in the core glass (Si-ODC & Ge-ODC). Although the microscopic mechanism of the photorefractive effect has not been established in detail, it is Ge-ODC that ensure UV light delivery into the fiber core owing to their strong absorption band centered at 242 nm. Naturally, one of the ways of increasing photosensitivity of silica-based fibers is optimization of the preform fabrication regimes with a view to maximize the Ge-ODC concentration.